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US Patent Issued to NANYA TECHNOLOGY on April 14 for "Semiconductor device and manufacturing method thereof" (Taiwanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,694, issued on April 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Semiconductor device and manufacturing method ... Read More


US Patent Issued to Sinfonia Technology on April 14 for "EFEM" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,695, issued on April 14, was assigned to Sinfonia Technology Co. Ltd. (Tokyo). "EFEM" was invented by Toshihiro Kawai (Tokyo) and Gengoro ... Read More


US Patent Issued to Sinfonia Technology on April 14 for "EFEM" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,695, issued on April 14, was assigned to Sinfonia Technology Co. Ltd. (Tokyo). "EFEM" was invented by Toshihiro Kawai (Tokyo) and Gengoro ... Read More


US Patent Issued to Tokyo Electron on April 14 for "Liquid processing method, liquid processing apparatus, and storage medium" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,696, issued on April 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Liquid processing method, liquid processing apparatus, and storage ... Read More


US Patent Issued to Tokyo Electron on April 14 for "Liquid processing method, liquid processing apparatus, and storage medium" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,696, issued on April 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Liquid processing method, liquid processing apparatus, and storage ... Read More


US Patent Issued on April 14 for "Waste gas treatment apparatus for semiconductor and display processes" (South Korean Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,697, issued on April 14. "Waste gas treatment apparatus for semiconductor and display processes" was invented by Chul Hwan Kim (Pyeongtaek... Read More


US Patent Issued on April 14 for "Waste gas treatment apparatus for semiconductor and display processes" (South Korean Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,697, issued on April 14. "Waste gas treatment apparatus for semiconductor and display processes" was invented by Chul Hwan Kim (Pyeongtaek... Read More


US Patent Issued to Tokyo Electron on April 14 for "Substrate processing system and state monitoring method" (Japanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,698, issued on April 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing system and state monitoring method" was invent... Read More


US Patent Issued to Tokyo Electron on April 14 for "Substrate processing system and state monitoring method" (Japanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,698, issued on April 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing system and state monitoring method" was invent... Read More


US Patent Issued to DISCO on April 14 for "Processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,699, issued on April 14, was assigned to DISCO Corp. (Tokyo). "Processing apparatus" was invented by Yunfeng Yang (Tokyo). According to t... Read More